- 专利标题: Tunneling field effect transistor
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申请号: US16767479申请日: 2018-11-28
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公开(公告)号: US11227953B2公开(公告)日: 2022-01-18
- 发明人: Kimihiko Kato , Shinichi Takagi , Mitsuru Takenaka , Hitoshi Tabata , Hiroaki Matsui
- 申请人: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 申请人地址: JP Saitama
- 专利权人: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人地址: JP Saitama
- 代理机构: Rossi, Kimms & McDowell LLP
- 国际申请: PCT/JP2018/043787 WO 20181128
- 国际公布: WO2019/107411 WO 20190606
- 主分类号: H01L29/786
- IPC分类号: H01L29/786 ; H01L29/08 ; H01L29/12 ; H01L29/165 ; H01L29/66 ; H01L29/775
摘要:
A tunneling field effect transistor according to an embodiment of the present invention includes: a first semiconductor layer having a first conductive type; a second semiconductor layer having a second conductive type and realizing a heterojunction with respect to the first semiconductor layer in a first region; a gate insulating layer over the second semiconductor layer in the first region; a gate electrode layer over the gate insulating layer; a first electrode layer electrically connected to the first semiconductor layer; a second electrode layer electrically connected to the second semiconductor layer; and a first insulating layer interposed between the first semiconductor layer and the second semiconductor layer in a second region adjacent to the first region toward the second electrode layer.
公开/授权文献
- US20210005758A1 TUNNELING FIELD EFFECT TRANSISTOR 公开/授权日:2021-01-07
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