Invention Grant
- Patent Title: Tunneling field effect transistor
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Application No.: US16767479Application Date: 2018-11-28
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Publication No.: US11227953B2Publication Date: 2022-01-18
- Inventor: Kimihiko Kato , Shinichi Takagi , Mitsuru Takenaka , Hitoshi Tabata , Hiroaki Matsui
- Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Applicant Address: JP Saitama
- Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee Address: JP Saitama
- Agency: Rossi, Kimms & McDowell LLP
- International Application: PCT/JP2018/043787 WO 20181128
- International Announcement: WO2019/107411 WO 20190606
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/08 ; H01L29/12 ; H01L29/165 ; H01L29/66 ; H01L29/775

Abstract:
A tunneling field effect transistor according to an embodiment of the present invention includes: a first semiconductor layer having a first conductive type; a second semiconductor layer having a second conductive type and realizing a heterojunction with respect to the first semiconductor layer in a first region; a gate insulating layer over the second semiconductor layer in the first region; a gate electrode layer over the gate insulating layer; a first electrode layer electrically connected to the first semiconductor layer; a second electrode layer electrically connected to the second semiconductor layer; and a first insulating layer interposed between the first semiconductor layer and the second semiconductor layer in a second region adjacent to the first region toward the second electrode layer.
Public/Granted literature
- US20210005758A1 TUNNELING FIELD EFFECT TRANSISTOR Public/Granted day:2021-01-07
Information query
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