- Patent Title: Cooling apparatus and plasma-cleaning station for cooling apparatus
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Application No.: US16625135Application Date: 2018-06-07
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Publication No.: US11231657B2Publication Date: 2022-01-25
- Inventor: Adrianus Hendrik Koevoets , Cornelis Adrianus De Meijere , Willem Michiel De Rapper , Sjoerd Nicolaas Lambertus Donders , Jan Groenewold , Alain Louis Claude Leroux , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Johannes Adrianus Cornelis Maria Pijnenburg , Jacobus Cornelis Gerardus Van Der Sanden
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Priority: EP17177884 20170626,EP17184274 20170801,EP17201079 20171110
- International Application: PCT/EP2018/065032 WO 20180607
- International Announcement: WO2019/001922 WO 20190103
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
Public/Granted literature
- US11287752B2 Cooling apparatus and plasma-cleaning station for cooling apparatus Public/Granted day:2022-03-29
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