- Patent Title: Transparent electrode for oxygen production, method for producing same, tandem water decomposition reaction electrode provided with same, and oxygen production device using same
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Application No.: US16784678Application Date: 2020-02-07
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Publication No.: US11248304B2Publication Date: 2022-02-15
- Inventor: Hiroshi Nishiyama , Tomohiro Higashi , Yutaka Sasaki , Taro Yamada , Kazunari Domen , Yohichi Suzuki , Seiji Akiyama
- Applicant: Mitsubishi Chemical Corporation , THE UNIVERSITY OF TOKYO , JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS , NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Chiyoda-ku; JP Bunkyo-ku; JP Chiyoda-ku; JP Chiyoda-ku
- Assignee: Mitsubishi Chemical Corporation,THE UNIVERSITY OF TOKYO,JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: Mitsubishi Chemical Corporation,THE UNIVERSITY OF TOKYO,JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Chiyoda-ku; JP Bunkyo-ku; JP Chiyoda-ku; JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2017-154524 20170809
- Main IPC: C25B11/075
- IPC: C25B11/075 ; C01B21/06 ; C25B1/04 ; C25B11/057 ; B01J37/02
Abstract:
A method for producing a transparent electrode for oxygen production having a Ta nitride layer on a transparent substrate, including: a step of forming a Ta nitride precursor layer on the transparent substrate; and a step of nitriding the Ta nitride precursor layer with a mixed gas containing ammonia and a carrier gas.
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