- 专利标题: Copper interconnect cladding
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申请号: US15937527申请日: 2018-03-27
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公开(公告)号: US11270943B2公开(公告)日: 2022-03-08
- 发明人: Flavio Griggio , Philip Yashar , Anthony V. Mule , Gopinath Trichy , Gokul Malyavanatham
- 申请人: INTEL CORPORATION
- 申请人地址: US CA Santa Clara
- 专利权人: INTEL CORPORATION
- 当前专利权人: INTEL CORPORATION
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwabe, Williamson & Wyatt, P.C.
- 主分类号: H01L23/532
- IPC分类号: H01L23/532 ; H01L21/768 ; H01L21/02 ; H01L23/522 ; H01L23/528 ; H01L27/02
摘要:
An integrated circuit includes: a front end of line (FEOL) circuit including a transistor; and a back end of line circuit above the FEOL circuit and including insulator material having an interconnect feature therein. The interconnect feature includes: a core including copper; a first layer between the insulator material and the core, the first layer being distinct from the core; a second layer between the first layer and the core, the second layer being distinct from the first layer and the core, the second layer including a first metal and a second metal different from the first metal; and a capping member on the core and the second layer, the capping member including the second metal. In an embodiment, the first metal and the second metal are part of a solid solution in the second layer. In an embodiment, the first metal is ruthenium and the second metal is cobalt.
公开/授权文献
- US20190304918A1 COPPER INTERCONNECT CLADDING 公开/授权日:2019-10-03
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