Invention Grant
- Patent Title: Connecting structure of a conductive layer
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Application No.: US16296646Application Date: 2019-03-08
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Publication No.: US11276580B2Publication Date: 2022-03-15
- Inventor: Su Bin Bae , Yu-Gwang Jeong , Shin Il Choi , Sang Gab Kim , Joon Geol Lee
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2018-0040628 20180406
- Main IPC: H01L29/41
- IPC: H01L29/41 ; H01L21/311 ; H01L21/027 ; H01L21/768 ; H01L21/763

Abstract:
A connecting structure of a conductive layer includes a first conductive layer, a first insulating layer disposed on the first conductive layer and including a first opening overlapping the first conductive layer, a connecting conductor disposed on the first insulating layer and connected to the first conductive layer through the first opening, an insulator island disposed on the connecting conductor, a second insulating layer disposed on the first insulating layer and including a second opening overlapping the connecting conductor and the insulator island, and a second conductive layer disposed on the second insulating layer and connected to a connecting electrode through the second opening. A sum of a thickness of the first insulating layer and a thickness of the second insulating layer is greater than or equal to 1 μm, and each of the thicknesses of the first and second insulating layers is less than 1 μm.
Information query
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