Invention Grant
- Patent Title: In-situ metrology and process control
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Application No.: US16662625Application Date: 2019-10-24
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Publication No.: US11289352B2Publication Date: 2022-03-29
- Inventor: Ramesh Krishnamurthy , Lakshmanan Karuppiah
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G05B19/418 ; G01N21/84 ; G01N21/35 ; G01J5/00 ; G01B11/06 ; G01N21/3563 ; H01L21/687
Abstract:
Methods and apparatus for the in-situ measurement of metrology parameters are disclosed herein. Some embodiments of the disclosure further provide for the real-time adjustment of process parameters based on the measure metrology parameters. Some embodiments of the disclosure provide for a multi-stage processing chamber top plate with one or more sensors between process stations.
Public/Granted literature
- US20200335369A1 In-Situ Metrology And Process Control Public/Granted day:2020-10-22
Information query
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