Invention Grant
- Patent Title: Metrology apparatus
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Application No.: US17267974Application Date: 2019-07-03
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Publication No.: US11300889B2Publication Date: 2022-04-12
- Inventor: Leon Paul Van Dijk , Richard Johannes Franciscus Van Haren , Subodh Singh , Ilya Malakhovsky , Ronald Henricus Johannes Otten , Amandev Singh
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18190150 20180822
- International Application: PCT/EP2019/067885 WO 20190703
- International Announcement: WO2020/038642 WO 20200227
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.
Public/Granted literature
- US20210165335A1 METROLOGY APPARATUS Public/Granted day:2021-06-03
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