公开(公告)号：US11300889B2

公开(公告)日：2022-04-12

申请号：US17267974

申请日：2019-07-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Leon Paul Van Dijk ,  Richard Johannes Franciscus Van Haren ,  Subodh Singh ,  Ilya Malakhovsky ,  Ronald Henricus Johannes Otten ,  Amandev Singh

IPC: G03F7/20

Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.