- 专利标题: Display device, method for forming a pattern and method for manufacturing display device
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申请号: US16905306申请日: 2020-06-18
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公开(公告)号: US11320712B2公开(公告)日: 2022-05-03
- 发明人: Seon-Il Kim , Sung Won Cho , Sang Gab Kim , Su Bin Bae , Yu-Gwang Jeong , Dae Won Choi
- 申请人: Samsung Display Co., LTD.
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., LTD.
- 当前专利权人: Samsung Display Co., LTD.
- 当前专利权人地址: KR Yongin-si
- 代理机构: Kile Park Reed & Houtteman PLLC
- 优先权: KR10-2019-0136543 20191030
- 主分类号: G02F1/1368
- IPC分类号: G02F1/1368 ; H01L51/56 ; G02F1/1362 ; H01L51/52 ; H01L27/32
摘要:
A display device includes a thin film transistor on a base substrate and a signal wiring electrically connected to the thin film transistor. The signal wiring includes a main conductive layer including copper, and a capping layer including titanium the capping layer overlapping a portion of an upper surface of the main conductive layer. The signal wiring has a taper angle in a range of about 70° to about 90°. A thickness of the capping layer is in a range of about 100 Å to about 300 Å, and a thickness of the main conductive layer is in a range of about 1,000 Å to about 20,000 Å.
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