Invention Grant
- Patent Title: Seal ring structures and methods of forming same
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Application No.: US16933082Application Date: 2020-07-20
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Publication No.: US11342322B2Publication Date: 2022-05-24
- Inventor: Kuo-Ming Wu , Kuan-Liang Liu , Wen-De Wang , Yung-Lung Lin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L25/00
- IPC: H01L25/00 ; H01L23/58 ; H01L23/00 ; H01L25/065 ; H01L25/18 ; H01L23/31

Abstract:
Some embodiments relate to a three-dimensional (3D) integrated circuit (IC). The 3D IC includes a first IC die comprising a first semiconductor substrate, and a first interconnect structure over the first semiconductor substrate. The 3D IC also includes a second IC die comprising a second semiconductor substrate, and a second interconnect structure that separates the second semiconductor substrate from the first interconnect structure. A seal ring structure separates the first interconnect structure from the second interconnect structure and perimetrically surrounds a gas reservoir between the first IC die and second IC die. The seal ring structure includes a sidewall gas-vent opening structure configured to allow gas to pass between the gas reservoir and an ambient environment surrounding the 3D IC.
Public/Granted literature
- US20200350302A1 SEAL RING STRUCTURES AND METHODS OF FORMING SAME Public/Granted day:2020-11-05
Information query
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