Invention Grant
- Patent Title: Barrier structure based on MPMDT/XT copolyamide with a high Tg
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Application No.: US16062231Application Date: 2016-12-15
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Publication No.: US11345131B2Publication Date: 2022-05-31
- Inventor: Thierry Briffaud , Mathieu Capelot , Nicolas Dufaure
- Applicant: ARKEMA FRANCE
- Applicant Address: FR Colombes
- Assignee: ARKEMA FRANCE
- Current Assignee: ARKEMA FRANCE
- Current Assignee Address: FR Colombes
- Agency: Buchanan Ingersoll & Rooney P.C.
- Priority: FR1562817 20151218
- International Application: PCT/FR2016/053466 WO 20161215
- International Announcement: WO2017/103502 WO 20170622
- Main IPC: B32B27/34
- IPC: B32B27/34 ; C08G69/26 ; C08L77/06 ; B32B27/08 ; B32B27/28 ; B32B27/30 ; B32B7/10 ; B32B27/36 ; B32B27/20 ; B32B27/22 ; B65D65/40

Abstract:
A barrier structure for the storage and/or transport of fluids, including at least one barrier layer (1) including an MPMDT/XT copolyamide in which: MPMDT is a unit with an amide motif having a molar ratio of between 5 and 50%, particularly between 5 and 45%, preferably between 15 and 45%, more preferably between 20 and 45%, where MPMD is 2-methyl pentamethylene diamine (MPMD) and T is terephthalic acid, XT being a unit with a majority amide motif having a molar ratio of between 50 and 95%, particularly between 55 and 95%, preferably between 55 and 85%, more preferably between 55 and 80%, where X is a C9 to C18, preferably C9, C10, C11 and C12, linear aliphatic diamine, and where T is terephthalic acid, the copolyamide having a melting point of 250° C.
Public/Granted literature
- US20180370208A1 BARRIER STRUCTURE BASED ON MPMDT/XT COPOLYAMIDE WITH A HIGH Tg Public/Granted day:2018-12-27
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