- Patent Title: Memory cell capacitor with varying width and supportive structures
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Application No.: US17077257Application Date: 2020-10-22
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Publication No.: US11355497B2Publication Date: 2022-06-07
- Inventor: Yoonho Son , Suklae Kim , Sejin Park , Seungjoong Shin , Hyuewon Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2020-0018452 20200214
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L49/02

Abstract:
A semiconductor device includes a memory cell storing data. The memory cell capacitor includes a plurality of bottom electrodes on a substrate and extending in a vertical direction with respect to a top surface of the substrate, the plurality of bottom electrodes being spaced apart from each other in a first direction parallel to the top surface of the substrate, an upper support pattern on upper lateral surfaces of the plurality of bottom electrodes, and a lower support pattern on lower lateral surfaces of the plurality of bottom electrodes. The lower support pattern is disposed between the substrate and the upper support pattern, and a first bottom electrode of the plurality of bottom electrodes includes a first recess adjacent to a bottom surface of the lower support pattern.
Public/Granted literature
- US20210257371A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2021-08-19
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