Invention Grant
- Patent Title: Salt, acid generator, resist composition and method for producing resist pattern
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Application No.: US16527271Application Date: 2019-07-31
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Publication No.: US11366387B2Publication Date: 2022-06-21
- Inventor: Tatsuro Masuyama , Takahiro Yasue , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2018-153459 20180817
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08L33/08 ; C08L33/10 ; G03F7/16 ; G03F7/20 ; C08L65/02

Abstract:
Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.
Public/Granted literature
- US20200057369A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2020-02-20
Information query
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