Invention Grant
- Patent Title: Etchant composition and forming method of wiring using etchant composition
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Application No.: US16854342Application Date: 2020-04-21
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Publication No.: US11384437B2Publication Date: 2022-07-12
- Inventor: Jong Hee Park , Jin Seock Kim , Bong Won Lee , Sang-woo Kim , Il-Ryong Park , Bong-Yeon Won , Dae-woo Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: KR10-2017-0079346 20170622
- Main IPC: C09K13/06
- IPC: C09K13/06 ; C23F1/16 ; C23F1/30 ; H01L21/3213 ; C23F1/02 ; H05K3/06 ; H01L27/12 ; H01L29/786

Abstract:
A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.
Public/Granted literature
- US20200248318A1 ETCHANT COMPOSITION AND FORMING METHOD OF WIRING USING ETCHANT COMPOSITION Public/Granted day:2020-08-06
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