公开(公告)号：US11384437B2

公开(公告)日：2022-07-12

申请号：US16854342

申请日：2020-04-21

Applicant: Samsung Display Co., Ltd.

Inventor： Jong Hee Park ,  Jin Seock Kim ,  Bong Won Lee ,  Sang-woo Kim ,  Il-Ryong Park ,  Bong-Yeon Won ,  Dae-woo Lee

IPC: C09K13/06 ,  C23F1/16 ,  C23F1/30 ,  H01L21/3213 ,  C23F1/02 ,  H05K3/06 ,  H01L27/12 ,  H01L29/786

Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.