Invention Grant
- Patent Title: In situ angle measurement using channeling
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Application No.: US16828218Application Date: 2020-03-24
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Publication No.: US11387073B2Publication Date: 2022-07-12
- Inventor: Frank Sinclair , Jonathan Gerald England , Joseph C. Olson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Nields, Lemack & Frame, LLC
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/20 ; H01J37/317 ; H01J37/141

Abstract:
A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.
Public/Granted literature
- US20210305011A1 In Situ Angle Measurement Using Channeling Public/Granted day:2021-09-30
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