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61 条记录 (耗时 0.022 秒)

    In situ angle measurement using channeling
    6.
    发明授权
    In situ angle measurement using channeling 有权

    公开(公告)号：US11387073B2

    公开(公告)日：2022-07-12

    申请号：US16828218

    申请日：2020-03-24

    申请人： Applied Materials, Inc.

    发明人： Frank Sinclair ,  Jonathan Gerald England ,  Joseph C. Olson

    IPC分类号： H01J37/244 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

    摘要： A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.

    TECHNIQUES FOR VARIABLE DEPOSITION PROFILES
    7.
    发明申请
    TECHNIQUES FOR VARIABLE DEPOSITION PROFILES 有权

    公开(公告)号：US20220119955A1

    公开(公告)日：2022-04-21

    申请号：US17072130

    申请日：2020-10-16

    申请人： Applied Materials, Inc.

    发明人： M. Arif Zeeshan ,  Shantanu Kallakuri ,  Joseph C. Olson

    IPC分类号： C23C16/56 ,  C23C16/04

    摘要： Embodiments of the present disclosure include positioning a mask over a substrate, wherein the mask has a planar surface separated from a top surface of the substrate by a mask distance, and wherein a mask opening is provided through the planar surface. The method may further include positioning a mask element across the mask opening, the mask element including one or more solid portions and one or more openings, and depositing, through the mask opening, a deposition material onto the substrate, wherein the deposition material has a variable profile as a result of the one or more solid portions and the one or more openings.

    Method of forming a plurality of gratings
    8.
    发明授权
    Method of forming a plurality of gratings 有权

    公开(公告)号：US11247298B2

    公开(公告)日：2022-02-15

    申请号：US16716997

    申请日：2019-12-17

    申请人： Applied Materials, Inc.

    发明人： Morgan Evans ,  Joseph C. Olson ,  Rutger Meyer Timmerman Thijssen

    IPC分类号： G02B5/18 ,  B23K26/34 ,  C04B41/00 ,  G02B6/34 ,  G03F7/00 ,  F21V8/00 ,  G06F3/01

    摘要： Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.