Invention Grant
- Patent Title: Ruthenium removal composition and method of producing magnetoresistive random access memory
-
Application No.: US16890505Application Date: 2020-06-02
-
Publication No.: US11456412B2Publication Date: 2022-09-27
- Inventor: Keeyoung Park , Atsushi Mizutani
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Solaris Intellectual Property Group, PLLC
- Priority: JPJP2014-222540 20141031
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L21/3065 ; H01L21/308 ; H01L43/08 ; H01L27/105 ; C23F1/40 ; C23F4/00 ; C23F1/30
Abstract:
A treatment liquid contains orthoperiodic acid and water, and the pH is 11 or more. It is preferable that the content of orthoperiodic acid in the treatment liquid is 0.01% to 5% by mass with respect to the total mass of the treatment liquid.
Public/Granted literature
- US20200295258A1 RUTHENIUM REMOVAL COMPOSITION AND METHOD OF PRODUCING MAGNETORESISTIVE RANDOM ACCESS MEMORY Public/Granted day:2020-09-17
Information query
IPC分类:
