Invention Grant
- Patent Title: Electron beam apparatus for optical device fabrication
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Application No.: US16716965Application Date: 2019-12-17
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Publication No.: US11462386B2Publication Date: 2022-10-04
- Inventor: Kartik Ramaswamy , Yang Yang , Manivannan Thothadri , Chien-An Chen , Ludovic Godet , Rutger Meyer Timmerman Thijssen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01J37/305
- IPC: H01J37/305 ; H01J37/32 ; G02B6/13 ; H01L21/3065 ; G02B5/18 ; H01J37/05 ; G02B6/12 ; G02B6/124 ; G06T19/00 ; H01J37/073 ; H01J37/304 ; H01J37/147

Abstract:
Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.
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