Invention Grant
- Patent Title: Microwell device and method of manufacturing the same
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Application No.: US16838901Application Date: 2020-04-02
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Publication No.: US11492581B2Publication Date: 2022-11-08
- Inventor: Keng-Hui Lin , Cheng-Kuang Huang
- Applicant: Academia Sinica
- Applicant Address: TW Taipei
- Assignee: Academia Sinica
- Current Assignee: Academia Sinica
- Current Assignee Address: TW Taipei
- Agency: Li & Cai Intellectual Property (USA) Office
- Main IPC: C12M1/32
- IPC: C12M1/32 ; C12M1/00 ; B01L3/00 ; C12N5/00

Abstract:
A microwell device and a method of manufacturing the same are provided. The microwell device includes a substrate and a plurality of microwells formed on the substrate. In addition, each of the microwells includes a cavity being recessed on the substrate and an opening, and the diameter of the opening is smaller than the largest inner diameter of the cavity. Furthermore, the microwells are curved.
Public/Granted literature
- US20200332239A1 MICROWELL DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-10-22
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