Invention Grant
- Patent Title: Vacuum wafer chuck for manufacturing semiconductor devices
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Application No.: US16998461Application Date: 2020-08-20
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Publication No.: US11508608B2Publication Date: 2022-11-22
- Inventor: Chien-Fa Lee , Chin-Lin Chou , Shang-Ying Tsai , Shou-Wen Kuo , Kuei-Sung Chang , Jiun-Rong Pai , Hsu-Shui Liu , Chun-wen Cheng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H01L21/683
- IPC: H01L21/683 ; B25B11/00

Abstract:
Disclosed is a vacuum chuck and a method for securing a warped semiconductor substrate during a semiconductor manufacturing process so as to improve its flatness during a semiconductor manufacturing process. For example, a semiconductor manufacturing system includes: a vacuum chuck configured to hold a substrate, wherein the vacuum chuck comprises, a plurality of vacuum grooves located on a top surface of the vacuum chuck, wherein the top surface is configured to face the substrate; and a plurality of flexible seal rings disposed on the vacuum chuck and extending outwardly from the top surface, wherein the plurality of flexible seal rings are configured to directly contact a bottom surface of the substrate and in adjacent to the plurality of vacuum grooves so as to form a vacuum seal between the substrate and the vacuum chuck, and wherein each of the plurality of flexible seal rings has a zigzag cross section.
Public/Granted literature
- US20220059393A1 VACUUM WAFER CHUCK FOR MANUFACTURING SEMICONDUCTOR DEVICES Public/Granted day:2022-02-24
Information query
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