- 专利标题: Vaporization device, film formation device, program for a concentration control mechanism, and concentration control method
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申请号: US16778503申请日: 2020-01-31
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公开(公告)号: US11519070B2公开(公告)日: 2022-12-06
- 发明人: Toru Shimizu , Masakazu Minami
- 申请人: HORIBA STEC, Co., Ltd.
- 申请人地址: JP Kyoto
- 专利权人: HORIBA STEC, Co., Ltd.
- 当前专利权人: HORIBA STEC, Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: Greenblum & Bernstein, P.L.C.
- 优先权: JPJP2019-023441 20190213
- 主分类号: C23C16/52
- IPC分类号: C23C16/52
摘要:
In order to inhibit overshoot in the concentration of a source gas immediately after a gas supply period starts, there is provided a vaporization device that is equipped with a vaporization tank that holds a liquid or a solid source, a carrier gas supply path that supplies carrier gas to the vaporization tank, a source gas extraction path along which flows a source gas which is obtained by vaporizing the source and which is extracted from the vaporization tank, a concentration monitor that is provided on the source gas extraction path, and a concentration control mechanism that is provided with a fluid controller which controls a concentration of the source gas extracted from the source gas extraction path. This vaporization device alternates between supplying the source gas and stopping the supply of the source gas.
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