Flow rate ratio control device, control program for a flow rate ratio control device and control method for a flow rate ratio control device

    公开(公告)号:US12153455B2

    公开(公告)日:2024-11-26

    申请号:US17451981

    申请日:2021-10-22

    Abstract: A flow rate ratio control device smoothly switches branches without generating abrupt changes in the flow rates of a fluid flowing therethrough. The device includes at least two branches from a main flow path, first and second fluid control valves each including a position sensor for a valve body, a storage unit that stores reference positions of the valve bodies in order to divide the fluid flowing into the branches at predetermined ratios, and a control unit that controls the ratios of the branches by performing position control to place the valve body of the first valve in the reference position, and by performing flow rate control to set the flow rate of the second valve to a target flow rate. When the valve body of the second valve reaches the reference position, the control unit switches the position control and flow rate control between the valves.

    FLUID CONTROL VALVE AND FLUID CONTROL DEVICE

    公开(公告)号:US20240360918A1

    公开(公告)日:2024-10-31

    申请号:US18610819

    申请日:2024-03-20

    CPC classification number: F16K31/52491 F16K31/007 F16K7/14

    Abstract: A fluid control valve improves position stability of a displacement expanding mechanism, and includes an actuator for driving the valve body, and the displacement expanding mechanism interposed between the valve body and the actuator to expand displacement of the actuator and transmit the displacement to the valve body. The displacement expanding mechanism includes an input member that is displaced upon receiving a driving force from the actuator, and a plurality of lever members that are disposed around a central axis of the valve body between the input member and the valve body, and expand displacement of the input member and transmit the displacement to the valve body. The plurality of lever members each have a contact surface with which the input member comes into contact to serve as a force point portion. The contact surface forms a downward gradient toward the central axis of the valve body.

    Valve orifice insert
    5.
    发明授权

    公开(公告)号:US11761547B1

    公开(公告)日:2023-09-19

    申请号:US17658431

    申请日:2022-04-07

    CPC classification number: F16K7/14 F16K1/425 F16K11/022 F16K27/0236

    Abstract: A valve orifice insert has a stepped-shaped wall including a first tubular section and a second tubular section having a smaller outer dimension than the first tubular section, and a lip structure protruding axially and including a planar valve seat surface. The first tubular section and the second tubular section being are joined by a step structure. At least one circumferential protrusion extends radially outward a predetermined distance from an outer surface of the first tubular section or an outer surface of the second tubular section to form an interference fit with the step-shaped opening when the valve orifice insert is fitted into the step-shaped opening.

    FLUID CONTROL DEVICE, FLUID CONTROL METHOD, AND FLUID CONTROL PROGRAM

    公开(公告)号:US20230229177A1

    公开(公告)日:2023-07-20

    申请号:US18147199

    申请日:2022-12-28

    CPC classification number: G05D7/0635 F16K37/005

    Abstract: A fluid control device includes a fluid resistance element provided to a channel, an upstream pressure sensor configured to detect an upstream pressure of the fluid resistance element, a downstream pressure sensor configured to detect a downstream pressure of the fluid resistance element, a flow rate calculating unit configured to calculate a flow rate flowing through the channel based on the upstream and downstream pressures, a valve provided upstream of the upstream pressure sensor or downstream of the downstream pressure sensor, and a valve control unit configured to control the valve based on the calculated flow rate. When the valve is fully closed, the flow rate calculating unit is configured to calculate the flow rate by switching a first flow rate calculation formula that is used when the valve is open, to a second flow rate calculation formula that is different from the first flow rate calculation formula.

    Vaporization system and concentration control module used in the same

    公开(公告)号:US11698649B2

    公开(公告)日:2023-07-11

    申请号:US17409041

    申请日:2021-08-23

    Inventor: Toru Shimizu

    Abstract: Provided is a concentration control module that improve responsiveness of concentration control of a vaporization system, and is used in a vaporization system. The concentration control module includes a concentration measuring part configured to measure a concentration of a source gas; a valve provided in a lead-out pipe configured to lead out the source gas from the tank; a pressure target value calculating part configured to calculate a pressure target value inside the tank by using a concentration target value of the source gas, and a concentration measured value of the concentration measuring part; a delay filter configured to generate a pressure control value by applying a predetermined time delay to the pressure target value obtained by the pressure target value calculating part; and a valve control part configured to feedback-control the valve by using a deviation between the pressure control value obtained by the delay filter, and a pressure inside the tank.

    Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recorded

    公开(公告)号:US11631596B2

    公开(公告)日:2023-04-18

    申请号:US16807722

    申请日:2020-03-03

    Abstract: In order to provide a concentration control apparatus that, without adding any new sensors or the like, makes it possible to accurately estimate a quantity of source consumed inside a vaporization tank, and to perform highly accurate concentration control in accordance with the remaining quantity of source, there is provided a concentration control apparatus that, in a vaporizer that is equipped with at least a vaporization tank containing a liquid or solid source, a carrier gas supply path that supplies a carrier gas to the vaporization tank, and a source gas extraction path along which flows a source gas which is created by vaporizing the source and is then extracted from the vaporization tank, controls a concentration of the source gas and includes a concentration monitor that is provided on the source gas extraction path, and outputs output signals in accordance with a concentration of the source gas.

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