Invention Grant
- Patent Title: Spin coater and semiconductor fabrication method for reducing regeneration of photoresist
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Application No.: US16803290Application Date: 2020-02-27
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Publication No.: US11537047B2Publication Date: 2022-12-27
- Inventor: Myung-Soo Hwang , Kwangsub Yoon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2019-0059191 20190521
- Main IPC: G03F7/16
- IPC: G03F7/16 ; H01L21/67 ; B05C11/02 ; B05B15/50 ; B05B13/02 ; B05B15/55 ; B05B1/24

Abstract:
Systems and methods for semiconductor fabrication are described. A spin coater comprises a spin chuck, a nozzle, a nozzle housing, a purge gas supply, and an organic solvent supply. The nozzle housing includes a lower housing including a solvent storage groove in which the organic solvent is stored, and an upper housing on the lower housing. The upper housing includes a nozzle insert hole on the solvent storage groove and receives the nozzle, and a gas supply hole connected to one side of the nozzle insert hole.
Public/Granted literature
- US20200371438A1 SPIN COATER AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME Public/Granted day:2020-11-26
Information query
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