Invention Grant
- Patent Title: Loosely-coupled inspection and metrology system for high-volume production process monitoring
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Application No.: US16287523Application Date: 2019-02-27
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Publication No.: US11562289B2Publication Date: 2023-01-24
- Inventor: Song Wu , Yin Xu , Andrei V. Shchegrov , Lie-Quan Lee , Pablo Rovira , Jonathan Madsen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G06N20/00
- IPC: G06N20/00 ; G01Q30/04 ; H01J37/26 ; G01N21/95 ; G01N23/201 ; G03F7/20

Abstract:
A metrology system is disclosed. In one embodiment, the metrology system includes a controller communicatively coupled to a reference metrology tool and an optical metrology tool, the controller including one or more processors configured to: generate a geometric model for determining a profile of a test HAR structure from metrology data from a reference metrology tool; generate a material model for determining one or more material parameters of a test HAR structure from metrology data from the optical metrology tool; form a composite model from the geometric model and the material model; measure at least one additional test HAR structure with the optical metrology tool; and determine a profile of the at least one additional test HAR structure based on the composite model and metrology data from the optical metrology tool associated with the at least one HAR test structure.
Public/Granted literature
- US20200184372A1 Loosely-Coupled Inspection and Metrology System for High-Volume Production Process Monitoring Public/Granted day:2020-06-11
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