Invention Grant
- Patent Title: Dielectric film with pressure sensitive microcapsules of adhesion promoter
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Application No.: US16480593Application Date: 2017-03-17
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Publication No.: US11571876B2Publication Date: 2023-02-07
- Inventor: Praneeth Akkinepally , Frank Truong , Dilan Seneviratne
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2017/022898 WO 20170317
- International Announcement: WO2018/169543 WO 20180920
- Main IPC: B32B27/36
- IPC: B32B27/36 ; B32B7/12 ; B32B15/20 ; C09J7/29 ; C09J7/40 ; C09J11/00 ; C08K5/17 ; C08K5/37 ; C09J7/25

Abstract:
Embodiments are generally directed to dielectric film with pressure sensitive microcapsules of adhesion promoter. An embodiment of an apparatus includes a dielectric film, the dielectric film including a dielectric material layer; a layer of pressure sensitive microcapsules on a first side of the dielectric material layer, the microcapsules including an adhesion promoter; and a cover material on the layer of microcapsules. The pressure sensitive microcapsules are to rupture upon application of a certain rupture pressure.
Public/Granted literature
- US20190389179A1 DIELECTRIC FILM WITH PRESSURE SENSITIVE MICROCAPSULES OF ADHESION PROMOTER Public/Granted day:2019-12-26
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