Invention Grant
- Patent Title: Memory device
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Application No.: US17470839Application Date: 2021-09-09
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Publication No.: US11574958B2Publication Date: 2023-02-07
- Inventor: Daisuke Matsubayashi , Kensuke Ota
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2021-027896 20210224
- Main IPC: H01L27/28
- IPC: H01L27/28 ; H01L51/05 ; H01L27/11582 ; G11C16/06

Abstract:
A memory device according to an embodiment includes a fluid layer extending in a first direction, a particle in the fluid layer, a first control electrode made of a first material, a first insulating film provided between the fluid layer and the first control electrode, a second control electrode made of a second material and provided to be spaced apart from the first control electrode in the first direction, a second insulating film provided between the fluid layer and the second control electrode, a third control electrode made of a third material different from the first material and the second material and provided between the first control electrode and the second control electrode, and a third insulating film provided between the fluid layer and the third control electrode.
Public/Granted literature
- US20220271093A1 MEMORY DEVICE Public/Granted day:2022-08-25
Information query
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