Invention Grant
- Patent Title: Low temperature chuck for plasma processing systems
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Application No.: US15581497Application Date: 2017-04-28
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Publication No.: US11594428B2Publication Date: 2023-02-28
- Inventor: Toan Q. Tran , Zilu Weng , Dmitry Lubomirsky , Satoru Kobayashi , Tae Seung Cho , Soonam Park , Son M. Phi , Shankar Venkataraman
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/3065 ; H01L21/683 ; H01L21/687 ; H01L21/311 ; H01J37/32

Abstract:
A wafer chuck assembly includes a puck, a shaft and a base. The puck includes an electrically insulating material that defines a top surface of the puck; a plurality of electrodes are embedded within the electrically insulating material. The puck also includes an inner puck element that forms one or more channels for a heat exchange fluid, the inner puck element being in thermal communication with the electrically insulating material, and an electrically conductive plate disposed proximate to the inner puck element. The shaft includes an electrically conductive shaft housing that is electrically coupled with the plate, and a plurality of connectors, including electrical connectors for the electrodes. The base includes an electrically conductive base housing that is electrically coupled with the shaft housing, and an electrically insulating terminal block disposed within the base housing, the plurality of connectors passing through the terminal block.
Public/Granted literature
- US20170229326A1 LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS Public/Granted day:2017-08-10
Information query
IPC分类: