Invention Grant
- Patent Title: Deposition system with multi-cathode and method of manufacture thereof
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Application No.: US17503994Application Date: 2021-10-18
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Publication No.: US11600476B2Publication Date: 2023-03-07
- Inventor: Anantha K. Subramani , Deepak Jadhav , Ashish Goel , Hanbing Wu , Prashanth Kothnur , Chi Hong Ching
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C16/34 ; C23C16/40 ; C23C14/34 ; C23C14/54 ; C23C14/35
Abstract:
A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.
Public/Granted literature
- US20220037136A1 Deposition System With Multi-Cathode And Method Of Manufacture Thereof Public/Granted day:2022-02-03
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