Invention Grant
- Patent Title: Resistance variable device with chalcogen-containing layer
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Application No.: US17014587Application Date: 2020-09-08
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Publication No.: US11600772B2Publication Date: 2023-03-07
- Inventor: Hiroki Kawai , Katsuyoshi Komatsu , Tadaomi Daibou , Hiroki Tokuhira , Masatoshi Yoshikawa , Yuichi Ito
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2019-235257 20191225
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A resistance variable device of an embodiment includes a stack arranged between a first electrode and a second electrode and including a resistance variable layer and a chalcogen-containing layer. The chalcogen-containing layer contains a material having a composition represented by a general formula: C1xC2yAz, where C1 is at least one element selected from Sc, Y, Zr, and Hf, C2 is at least one element selected from C, Si, Ge, B, Al, Ga, and In, A is at least one element selected from S, Se, and Te, and x, y, and z are numbers representing atomic ratios satisfying 0
Public/Granted literature
- US20210202838A1 RESISTANCE VARIABLE DEVICE Public/Granted day:2021-07-01
Information query
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