Invention Grant
- Patent Title: Laser processing system, and laser processing method
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Application No.: US16541669Application Date: 2019-08-15
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Publication No.: US11602803B2Publication Date: 2023-03-14
- Inventor: Takashi Izumi
- Applicant: Fanuc Corporation
- Applicant Address: JP Yamanashi
- Assignee: Fanuc Corporation
- Current Assignee: Fanuc Corporation
- Current Assignee Address: JP Yamanashi
- Agency: RatnerPrestia
- Priority: JPJP2018-157795 20180824
- Main IPC: B23K26/14
- IPC: B23K26/14 ; B23K26/12 ; B23K26/046 ; B23K26/382 ; B23K26/142

Abstract:
A laser processing system capable of reliably determining an abnormality in a jet during laser process. The laser processing system comprises a nozzle including an emission opening configured to emit a jet of an assist gas along an optical axis of a laser beam, the nozzle being configured to form a maximum point of velocity of the jet at a position away from the emission opening; a measuring instrument configured to measure any of the velocity of the jet and a sound generated by the jet impinging on a workpiece; and an abnormality determination section configured to determine whether or not output data of the measuring instrument is different from reference data.
Public/Granted literature
- US20200061746A1 LASER PROCESSING SYSTEM, AND LASER PROCESSING METHOD Public/Granted day:2020-02-27
Information query
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