Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
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Application No.: US16722026Application Date: 2019-12-20
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Publication No.: US11604412B2Publication Date: 2023-03-14
- Inventor: Akihiro Kaneko , Junichi Ito , Takashi Kawashima , Michihiro Ogawa , Tomotaka Tsuchimura
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2017-167802 20170831
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; C08F212/14 ; G03F7/20 ; G03F7/30
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation.
Information query
IPC分类:
