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公开(公告)号：US11656548B2
公开(公告)日：2023-05-23
申请号：US16905566
申请日：2020-06-18
申请人： FUJIFILM Corporation
发明人： Tomotaka Tsuchimura , Takashi Kawashima , Akihiro Kaneko , Michihiro Ogawa , Michihiro Shirakawa , Hajime Furutani , Kyohei Sakita
IPC分类号： G03F7/004 , C08F220/18 , C08F220/28 , C08F212/14 , G03F1/22 , G03F7/038 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , C08F212/24 , C08F220/1804 , C08F220/1806 , C08F220/1811 , C08F220/281 , C08F220/282 , G03F1/22 , G03F7/038 , G03F7/039 , G03F7/2004 , G03F7/2037
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y.
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公开(公告)号：US09798044B2
公开(公告)日：2017-10-24
申请号：US14497593
申请日：2014-09-26
申请人： FUJIFILM Corporation
发明人： Akihiro Kaneko , Masaaki Tsukase , Masataka Satou
IPC分类号： C09K9/00 , G02B1/08 , C07D409/04 , C07D417/06 , C07D495/04 , C07D207/44 , G02F1/361 , C07D417/14 , G02B5/30
CPC分类号： G02B1/08 , C07D207/44 , C07D409/04 , C07D417/06 , C07D417/14 , C07D495/04 , G02B5/3025 , G02F1/3612 , G02F1/3614 , G02F1/3615
摘要： There is provided an organic nonlinear optical material including a polymer binder and a compound represented by the following Formula (I): wherein, in Formula (I), R1 and R2 each independently represent a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; R3 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; and L represents a divalent linking group connecting a nitrogen atom and an oxopyrroline ring having a dicyanomethylidene group in a π-conjugated system containing an azo group (—N═N—).
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3.发明授权Organic film transistor, organic semiconductor film, and organic semiconductor material and use applications thereof 有权有机薄膜晶体管，有机半导体薄膜和有机半导体材料及其应用公开(公告)号：US09508934B2
公开(公告)日：2016-11-29
申请号：US14993403
申请日：2016-01-12
申请人： FUJIFILM Corporation
发明人： Akihiro Kaneko , Koji Takaku , Yasunori Yonekuta , Yuki Hirai , Hiroki Sugiura , Masashi Koyanagi , Kensuke Masui
CPC分类号： H01L51/0036 , C08G61/126 , C08G2261/1412 , C08G2261/1424 , C08G2261/18 , C08G2261/314 , C08G2261/3223 , C08G2261/3243 , C08G2261/344 , C08G2261/414 , C08G2261/92 , C08L65/00 , H01L51/0003 , H01L51/0043 , H01L51/0545 , H01L51/0558
摘要： An organic film transistor containing a compound, which is composed of n repeating units represented by Formula (101-1), in a semiconductor active layer is an organic film transistor using a compound having high carrier mobility and high solubility in an organic solvent; where each of R111 to R114 independently represents a hydrogen atom or a substituent; each of Ar101 and Ar102 independently represents a heteroarylene group or an arylene group; V101 represents a divalent linking group; m represents an integer of 0 to 6; when m is equal to or greater than 2, two or more groups represented by V101 may be the same as or different from each other; and n is equal to or greater than 2.
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公开(公告)号：US11640113B2
公开(公告)日：2023-05-02
申请号：US16368522
申请日：2019-03-28
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , G03F7/38 , G03F7/038 , C08F220/18 , G03F7/16 , G03F7/20 , G03F7/32 , H01L21/027
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R11 and R12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)
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公开(公告)号：US11604414B2
公开(公告)日：2023-03-14
申请号：US16655447
申请日：2019-10-17
申请人： FUJIFILM Corporation
发明人： Michihiro Shirakawa , Hajime Furutani , Mitsuhiro Fujita , Tomotaka Tsuchimura , Takashi Kawashima , Michihiro Ogawa , Akihiro Kaneko , Hironori Oka , Yasuharu Shiraishi
摘要： A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127) Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.
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公开(公告)号：US20210286264A1
公开(公告)日：2021-09-16
申请号：US17321803
申请日：2021-05-17
申请人： FUJIFILM Corporation
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).
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公开(公告)号：US12032288B2
公开(公告)日：2024-07-09
申请号：US17307091
申请日：2021-05-04
申请人： FUJIFILM Corporation
发明人： Masafumi Kojima , Minoru Uemura , Akihiro Kaneko , Akiyoshi Goto , Kei Yamamoto
IPC分类号： G03F7/004 , C07C25/18 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07D327/06 , C07D333/46
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07D327/06 , C07D333/46 , C07C2602/42 , C07C2603/74
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.
M1+A−-L-B−M2+ (I)-
公开(公告)号：US12001140B2
公开(公告)日：2024-06-04
申请号：US17169757
申请日：2021-02-08
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , C08F212/14 , C08F220/18 , C08F220/58 , G03F7/038
CPC分类号： G03F7/039 , C08F212/24 , C08F220/1806 , C08F220/585 , G03F7/038
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).
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公开(公告)号：US20200319551A1
公开(公告)日：2020-10-08
申请号：US16905566
申请日：2020-06-18
申请人： FUJIFILM Corporation
发明人： Tomotaka Tsuchimura , Takashi Kawashima , Akihiro Kaneko , Michihiro Ogawa , Michihiro Shirakawa , Hajime Furutani , Kyohei Sakita
IPC分类号： G03F7/004 , G03F1/22 , G03F7/038 , G03F7/039 , G03F7/20 , C08F220/18 , C08F220/28 , C08F212/14
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y.
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10.发明申请公开(公告)号：US20190187558A1
公开(公告)日：2019-06-20
申请号：US16285839
申请日：2019-02-26
申请人： FUJIFILM Corporation
IPC分类号： G03F7/038 , G03F7/039 , G03F7/004 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , C08F220/18 , C08F220/30
CPC分类号： G03F7/038 , C08F220/18 , C08F220/30 , C08F2220/302 , G03F7/0045 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/168 , G03F7/2004 , G03F7/325 , G03F7/38
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin and a compound that generates acid due to irradiation with an actinic ray or radiation. The resin includes a repeating unit (a) represented by Formula (I-1) and a repeating unit (b) having a group in which a protective group including a monocyclic ring leaves due to an action of an acid to generate a polar group. (In the formula, R11 and R12 each independently represent a hydrogen atom or an alkyl group. R13 represents a hydrogen atom or an alkyl group, or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring. n represents an integer of 2 or more.)
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