- 专利标题: Vertical transistors
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申请号: US17116120申请日: 2020-12-09
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公开(公告)号: US11637175B2公开(公告)日: 2023-04-25
- 发明人: Yi Fang Lee , Hung-Wei Liu , Ning Lu , Anish A. Khandekar , Jeffery B. Hull , Silvia Borsari
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Wells St. John P.S.
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L29/786
摘要:
A vertical transistor comprises a top source/drain region, a bottom source/drain region, a channel region vertically between the top and bottom source/drain regions, and a gate operatively laterally-adjacent the channel region. The top source/drain region and the channel region have a top interface and the bottom source/drain region and the channel region have a bottom interface. The channel region is crystalline and has an average crystal grain size of its crystal grains that is less than 20 nanometers. The channel region at the top interface or at the bottom interface has greater horizontal texture than volume of the crystal grains in the channel region that is vertically between the crystal grains that are at the top and bottom interfaces. Other embodiments and aspects are disclosed.
公开/授权文献
- US20220181434A1 Vertical Transistors 公开/授权日:2022-06-09
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