Invention Grant
- Patent Title: Photo-mask and semiconductor process
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Application No.: US17128246Application Date: 2020-12-21
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Publication No.: US11662658B2Publication Date: 2023-05-30
- Inventor: You-Ming Ke
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C.
- Priority: CN 2011259051.8 2020.11.12
- Main IPC: G03F1/36
- IPC: G03F1/36 ; G03F1/38 ; G03F7/20 ; H01L21/027 ; G03F7/00
Abstract:
A photo-mask and a semiconductor process are provided. The photo-mask includes a substrate and a non-printable pattern on the substrate. A pattern size of the non-printable pattern is smaller than a critical resolution of a lithography equipment using the photo-mask to perform a lithography process.
Public/Granted literature
- US20220146926A1 PHOTO-MASK AND SEMICONDUCTOR PROCESS Public/Granted day:2022-05-12
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