公开(公告)号：US11662658B2

公开(公告)日：2023-05-30

申请号：US17128246

申请日：2020-12-21

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： You-Ming Ke

IPC: G03F1/36 ,  G03F1/38 ,  G03F7/20 ,  H01L21/027 ,  G03F7/00

CPC classification number: G03F1/38 ,  G03F1/36 ,  G03F7/0002 ,  H01L21/0274

Abstract: A photo-mask and a semiconductor process are provided. The photo-mask includes a substrate and a non-printable pattern on the substrate. A pattern size of the non-printable pattern is smaller than a critical resolution of a lithography equipment using the photo-mask to perform a lithography process.