Invention Grant
- Patent Title: MRAM containing magnetic top contact
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Application No.: US17248479Application Date: 2021-01-27
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Publication No.: US11665974B2Publication Date: 2023-05-30
- Inventor: Michael Rizzolo , Saba Zare , Virat Vasav Mehta , Eric Raymond Evarts
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent L. Jeffrey Kelly
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/16

Abstract:
An embodiment of the invention may include a magnetic random-access memory (MRAM) structure and method of making the structure. The MRAM structure may include a magnetic tunnel junction stack. The MRAM structure may include a magnetic liner located between the magnetic tunnel junction stack and a top contact, where the magnetic liner may be a ferromagnetic material. This may enable the magnetic liner to act as an independent variable to balance many of the magnetic parameters in the MTJ film stack in order to achieve zero magnetic field at the MTJ layer.
Public/Granted literature
- US20220238794A1 MRAM CONTAINING MAGNETIC TOP CONTACT Public/Granted day:2022-07-28
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