Invention Grant
- Patent Title: Power semiconductor device with dV/dt controllability and low gate charge
-
Application No.: US17208779Application Date: 2021-03-22
-
Publication No.: US11682700B2Publication Date: 2023-06-20
- Inventor: Alexander Philippou , Roman Baburske , Christian Jaeger , Johannes Georg Laven , Helmut Maeckel
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE 2018107568.5 2018.03.29
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/06 ; H01L29/423 ; H01L29/08 ; H01L29/78 ; H01L29/66 ; H01L29/739

Abstract:
An power semiconductor device having a barrier region is provided. A power unit cell of the power semiconductor device has at least two trenches that may both extend into the barrier region. The at least two trenches may both have a respective trench electrode coupled to a control terminal of the power semiconductor device. For example, the trench electrodes are structured to reduce the total gate charge of the power semiconductor device. The barrier region may be p-doped and vertically confined, i.e., in and against the extension direction, by the drift region. The barrier region can be electrically floating.
Public/Granted literature
- US20210210604A1 Power Semiconductor Device with dV/dt Controllability and Low Gate Charge Public/Granted day:2021-07-08
Information query
IPC分类: