Invention Grant
- Patent Title: Asymmetrically angled gate structure and method for making same
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Application No.: US17152956Application Date: 2021-01-20
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Publication No.: US11682721B2Publication Date: 2023-06-20
- Inventor: Matthew Thomas Dejarld , John P. Bettencourt , Adam Lyle Moldawer , Kenneth A. Wilson
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Bachman & LaPointe, P.C.
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/40 ; H01L29/423 ; H01L29/66 ; H01L21/285

Abstract:
A high electron mobility transistor (HEMT) includes a substrate; a source on the substrate; a drain on the substrate spaced from the source; and a gate between the source and the drain, wherein the gate has a stem contacting the substrate, the stem having a source side surface and a drain side surface, wherein a source side angle is defined between the source side surface and an upper planar surface of the substrate and a drain side angle is defined between the drain side surface and the upper planar surface of the substrate, and wherein the source side angle and the drain side angle are asymmetric. Methods for making the HEMT are also disclosed.
Public/Granted literature
- US20220231154A1 ASYMMETRICALLY ANGLED GATE STRUCTURE AND METHOD FOR MAKING SAME Public/Granted day:2022-07-21
Information query
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