- 专利标题: Automated transfer and drying tool for process chamber
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申请号: US17236276申请日: 2021-04-21
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公开(公告)号: US11699619B2公开(公告)日: 2023-07-11
- 发明人: Tsung-Sheng Kuo , Hsu-Shui Liu , Jiun-Rong Pai , Shou-Wen Kuo , Yang-Ann Chu
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Eschweiler & Potashnik, LLC
- 分案原申请号: US15903815 2018.02.23
- 主分类号: H01L21/78
- IPC分类号: H01L21/78 ; B28D5/00 ; B28D7/04 ; H01L21/67 ; H01L21/66 ; H01L21/02
摘要:
Some embodiments relate to a processing tool for processing a singulated semiconductor die. The tool includes an evaluation unit, a drying unit, and a die wipe station. The evaluation unit is configured to subject the singulated semiconductor die to a liquid to detect flaws in the singulated semiconductor die. The drying unit is configured to dry the liquid from a frontside of the singulated semiconductor die. The die wipe station includes an absorptive drying structure configured to absorb the liquid from a backside of the singulated semiconductor die after the drying unit has dried the liquid from the frontside of the singulated semiconductor die.
公开/授权文献
- US20210242085A1 AUTOMATED TRANSFER AND DRYING TOOL FOR PROCESS CHAMBER 公开/授权日:2021-08-05
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