- 专利标题: Sensor assembly and methods of vapor monitoring in process chambers
-
申请号: US17374189申请日: 2021-07-13
-
公开(公告)号: US11721566B2公开(公告)日: 2023-08-08
- 发明人: Xiaozhou Che , Graeme Jamieson Scott , Richard Gustav Hagborg , Alan H. Ouye , Nelson A. Yee
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson + Sheridan, LLP
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; C23C14/54 ; C23C16/455 ; G01B17/02 ; H01L21/66 ; C23C14/04 ; C23C14/12
摘要:
Methods and systems for monitoring film thickness using a sensor assembly include a process chamber having a chamber body, a substrate support disposed in the chamber body, a lid disposed over the chamber body, and a sensor assembly coupled to the chamber body at a lower portion of the sensor assembly. The sensor assembly is coupled to the lid at an upper portion of the sensor assembly. The sensor assembly includes one or more apertures disposed through one or more sides of the sensor assembly, and the one or more sensors are disposed in the sensor assembly through the one or more of the apertures.
公开/授权文献
信息查询
IPC分类: