- Patent Title: Chemical vapor deposition of thick inorganic coating on a polarizer
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Application No.: US16674195Application Date: 2019-11-05
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Publication No.: US11746418B2Publication Date: 2023-09-05
- Inventor: Matthew R. Linford , Brian Johnson , Anubhav Diwan
- Applicant: Moxtek, Inc.
- Applicant Address: US UT Orem
- Assignee: Moxtek, Inc.
- Current Assignee: Moxtek, Inc.
- Current Assignee Address: US UT Orem
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/40 ; C23C16/48 ; C23C16/56 ; G02B5/30 ; C23C16/50 ; C23C16/448 ; C23C16/02

Abstract:
Thick, inorganic coatings can be deposited on a polarizer by chemical vapor deposition. In one embodiment, the method can comprise activating a surface of the polarizer with an oxygen plasma in an oven; injecting a solution including tetrakis(dimethylamino)silane dissolved in cyclohexane and water into the oven; and vapor depositing silicon dioxide onto the polarizer. These three steps can be repeated multiple times until desired thickness is attained.
Public/Granted literature
- US20200173021A1 Chemical Vapor Deposition of Thick Inorganic Coating on a Polarizer Public/Granted day:2020-06-04
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