- Patent Title: Semiconductor memory device and method of manufacturing the same
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Application No.: US17206763Application Date: 2021-03-19
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Publication No.: US11758726B2Publication Date: 2023-09-12
- Inventor: Shinya Arai
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H10B43/27 ; G11C16/04 ; H01L49/02 ; H10B43/30 ; G11C16/26 ; H10B41/20 ; H10B41/23

Abstract:
A semiconductor memory device according to an embodiment comprises: a semiconductor substrate; a stacked body having a plurality of first insulating layers and conductive layers stacked alternately on the semiconductor substrate; a columnar semiconductor layer contacting the semiconductor substrate in the stacked body being provided extending in a stacking direction of the stacked body and including a first portion and a second portion which is provided above the first portion; a memory layer provided on a side surface of the columnar semiconductor layer facing the stacked conductive layers and extending along the columnar semiconductor layer; and a second insulating layer provided between one of the first insulating layer and the conductive layers of the stacked body. The columnar semiconductor layer has a boundary of the first portion and the second portion, the boundary being close to the second insulating layer; and an average value of an outer diameter of the memory layer facing a side surface of the second insulating layer is larger than that of of the memory layer facing a side surface of a lowermost layer of the first insulating layers in the second portion.
Public/Granted literature
- US20210210508A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2021-07-08
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