Invention Grant
- Patent Title: Enhanced resolution in semiconductor fabrication data acquisition instruments using machine learning
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Application No.: US16820032Application Date: 2020-03-16
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Publication No.: US11763161B2Publication Date: 2023-09-19
- Inventor: Yan Chen , Xinkang Tian , Zheng Yan
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G01J3/28
- IPC: G01J3/28 ; G01J3/02 ; G06N20/00 ; G06F18/213 ; G06F18/214 ; G06V10/44 ; G06N3/084 ; G06N3/08 ; G06V10/82

Abstract:
A data set is stored in memory circuitry that is indicative of a state of a semiconductor fabrication process or of semiconductor structure fabricated thereby. Features in the data set are discernable to an extent limited by a data resolution. A machine-learning model comprising parameters having respective values assigned thereto as constrained by a model training process is also stored in the memory circuitry. Processor circuitry communicatively coupled to the memory circuitry generates an output data set from the data set in accordance with the machine-learning model such that features in the output data set are discernable to an extent limited by an output data resolution that is finer than the data resolution of the data set.
Public/Granted literature
- US20200292388A1 ENHANCED RESOLUTION IN SEMICONDUCTOR FABRICATION DATA ACQUISITION INSTRUMENTS USING MACHINE LEARNING Public/Granted day:2020-09-17
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