公开(公告)号：US09970818B2

公开(公告)日：2018-05-15

申请号：US14530164

申请日：2014-10-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Junwei Bao ,  Ching-Ling Meng ,  Holger Tuitje ,  Mihail Mihaylov ,  Yan Chen ,  Zheng Yan ,  Haixing Zou ,  Hanyou Chu

IPC: G01J3/30 ,  G01J3/443 ,  G01N21/31 ,  G01N21/68

CPC classification number: G01J3/443 ,  G01N21/31 ,  G01N21/68 ,  G01N2201/10

Abstract: Disclosed is a method, computer method, system, and apparatus for measuring two-dimensional distributions of optical emissions from a plasma in a semiconductor plasma processing chamber. The acquired two-dimensional distributions of plasma optical emissions can be used to infer the two-dimensional distributions of concentrations of certain chemical species of interest that are present in the plasma, and thus provide a useful tool for process development and also for new and improved processing tool development. The disclosed technique is computationally simple and inexpensive, and involves the use of an expansion of the assumed optical intensity distribution into a sum of basis functions that allow for circumferential variation of optical intensity. An example of suitable basis functions are Zernike polynomials.

公开(公告)号：US20170140905A1

公开(公告)日：2017-05-18

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/42 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.

公开(公告)号：US11763161B2

公开(公告)日：2023-09-19

申请号：US16820032

申请日：2020-03-16

Applicant: Tokyo Electron Limited

Inventor： Yan Chen ,  Xinkang Tian ,  Zheng Yan

IPC: G01J3/28 ,  G01J3/02 ,  G06N20/00 ,  G06F18/213 ,  G06F18/214 ,  G06V10/44 ,  G06N3/084 ,  G06N3/08 ,  G06V10/82

CPC classification number: G06N3/084 ,  G01J3/0275 ,  G01J3/2823 ,  G06F18/213 ,  G06F18/2148 ,  G06N3/08 ,  G06N20/00 ,  G06V10/454 ,  G06V10/82

Abstract: A data set is stored in memory circuitry that is indicative of a state of a semiconductor fabrication process or of semiconductor structure fabricated thereby. Features in the data set are discernable to an extent limited by a data resolution. A machine-learning model comprising parameters having respective values assigned thereto as constrained by a model training process is also stored in the memory circuitry. Processor circuitry communicatively coupled to the memory circuitry generates an output data set from the data set in accordance with the machine-learning model such that features in the output data set are discernable to an extent limited by an output data resolution that is finer than the data resolution of the data set.

公开(公告)号：US20200292388A1

公开(公告)日：2020-09-17

申请号：US16820032

申请日：2020-03-16

Applicant: Tokyo Electron Limited

Inventor： Yan CHEN ,  Xinkang Tian ,  Zheng Yan

IPC: G01J3/28 ,  G01J3/02 ,  G06K9/62 ,  G06K9/46 ,  G06N3/08 ,  G06N20/00

Abstract: A data set is stored in memory circuitry that is indicative of a state of a semiconductor fabrication process or of semiconductor structure fabricated thereby. Features in the data set are discernable to an extent limited by a data resolution. A machine-learning model comprising parameters having respective values assigned thereto as constrained by a model training process is also stored in the memory circuitry. Processor circuitry communicatively coupled to the memory circuitry generates an output data set from the data set in accordance with the machine-learning model such that features in the output data set are discernable to an extent limited by an output data resolution that is finer than the data resolution of the data set.

公开(公告)号：US10692705B2

公开(公告)日：2020-06-23

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/46 ,  G01J1/42 ,  G01J3/443 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.

公开(公告)号：US20180286643A1

公开(公告)日：2018-10-04

申请号：US15472494

申请日：2017-03-29

Applicant: Tokyo Electron Limited

Inventor： Holger TUITJE ,  Xinkang Tian ,  Ching-Ling Meng ,  Vi Vuong ,  Wen Jin ,  Zheng Yan ,  Mihail Mihaylov

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/3065 ,  H01L21/66 ,  G01N21/31 ,  G06N99/00

Abstract: An apparatus, system, and method for in-situ etching monitoring in a plasma processing chamber. The apparatus includes a continuous wave broadband light source; an illumination system configured to illuminate an area on a substrate with an incident light beam having a fixed polarization direction, the incident light beam from the broadband light source being modulated by a shutter; a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and direct the reflected light beam to a detector; and processing circuitry. The processing circuitry is configured to process the reflected light beam to suppress background light, determine a property value from the processed light, and control an etch process based on the determined property value.