Invention Grant
- Patent Title: Lateral heterojunction bipolar transistor with improved breakdown voltage and method
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Application No.: US17586862Application Date: 2022-01-28
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Publication No.: US11777019B2Publication Date: 2023-10-03
- Inventor: Hong Yu , Vibhor Jain , Judson R. Holt
- Applicant: GlobalFoundries U.S. Inc.
- Applicant Address: US NY Malta
- Assignee: GlobalFoundries U.S. Inc.
- Current Assignee: GlobalFoundries U.S. Inc.
- Current Assignee Address: US NY Malta
- Agency: Hoffman Warnick LLC
- Agent Francois Pagette
- Main IPC: H01L29/737
- IPC: H01L29/737 ; H01L29/08 ; H01L29/66 ; H01L29/735

Abstract:
Disclosed is a semiconductor structure including a device, such as a lateral heterojunction bipolar transistor (HBT), made up of a combination of at least three different semiconductor materials with different bandgap sizes for improved performance. In the device, a base layer of the base region can be positioned laterally between a collector layer of a collector region and an emitter layer of an emitter region and can be physically separated therefrom by buffer layers. The base layer can be made of a narrow bandgap semiconductor material, the collector layer and, optionally, the emitter layer can be made of a wide bandgap semiconductor material, and the buffer layers can be made of a semiconductor material with a bandgap between that of the narrow bandgap semiconductor material and the wide bandgap semiconductor material. Also disclosed herein is a method of forming the structure.
Public/Granted literature
- US20230102573A1 LATERAL HETEROJUNCTION BIPOLAR TRANSISTOR WITH IMPROVED BREAKDOWN VOLTAGE AND METHOD Public/Granted day:2023-03-30
Information query
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