- 专利标题： Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method
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申请号： US17107016申请日： 2020-11-30
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公开(公告)号： US11787894B2公开(公告)日： 2023-10-17
- 发明人: Azusa Oshita , Minori Takegoshi , Mitsuru Kato , Chihiro Okamoto , Shinya Kato
- 申请人： KURARAY CO., LTD.
- 申请人地址： JP Kurashiki
- 专利权人： KURARAY CO., LTD.
- 当前专利权人： KURARAY CO., LTD.
- 当前专利权人地址： JP Kurashiki
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP 17095378 2017.05.12
- 分案原申请号： US16608050
- 主分类号： C08G18/38
- IPC分类号： C08G18/38 ; B24B37/24 ; C08G18/32 ; C08G18/76 ; H01L21/3105 ; H01L21/321 ; C08G18/08 ; B24D3/00 ; B24D3/34
摘要：
A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.
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