Invention Grant
- Patent Title: Method for manufacturing electronic device having a seed layer on a substrate
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Application No.: US17834869Application Date: 2022-06-07
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Publication No.: US11789066B2Publication Date: 2023-10-17
- Inventor: Yeong-E Chen
- Applicant: Innolux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: Innolux Corporation
- Current Assignee: Innolux Corporation
- Current Assignee Address: TW Miao-Li County
- Agency: JCIPRNET
- Main IPC: G01R31/28
- IPC: G01R31/28 ; H01L21/768 ; H01L23/00

Abstract:
A method for manufacturing an electronic device includes the following steps. A substrate including a first region and a second region is provided. A seed layer is formed on the substrate. A circuit structure layer is formed on the seed layer, and the circuit structure layer has a plurality of first circuit structures disposed on the first region and a plurality of second circuit structures disposed on the second region. The first circuit structures and the second circuit structures are electrically connected through the seed layer. A circuit test process is performed and includes applying a predetermined voltage to the second circuit structures to test the first circuit structures to determine whether the first circuit structures are normal or not.
Public/Granted literature
- US20220299565A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE Public/Granted day:2022-09-22
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