Invention Grant
- Patent Title: Source leakage current suppression by source surrounding gate structure
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Application No.: US16862875Application Date: 2020-04-30
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Publication No.: US11791388B2Publication Date: 2023-10-17
- Inventor: Aurelien Gauthier Brun , Chun Lin Tsai , Jiun-Lei Jerry Yu , Po-Chih Chen , Yun-Hsiang Wang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/423 ; H01L29/778 ; H01L29/205 ; H01L21/3213 ; H01L21/02 ; H01L29/20 ; H01L29/66

Abstract:
In some embodiments, the present disclosure relates to a transistor device. The transistor device that includes a source contact disposed over a substrate. The source contact has a first side and an opposing second side disposed between a first end and an opposing second end. A drain contact is disposed over the substrate and is separated from the source contact along a first direction. A gate structure is disposed over the substrate between the source contact and the drain contact. The gate structure extends along the first side of the source contact facing the drain contact and also wraps around the first end and the opposing second end of the source contact.
Public/Granted literature
- US20210273065A1 SOURCE LEAKAGE CURRENT SUPPRESSION BY SOURCE SURROUNDING GATE STRUCTURE Public/Granted day:2021-09-02
Information query
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